1J85 Fe-Ni Alloy Sputtering Target

Senxiang (Ningbo) New Materials Co., Ltd. can provide 1J85 Fe-Ni Alloy Sputtering Alloy, relying on years of experience in producing various alloy sputtering target products. 1J85 Fe-Ni alloy sputtering target produced by Senxiang has high magnetic conductivity, extremely low coercivity and low loss value, and is sensitive to weak signals. High quality alloy sputtering target can meet many applications, if you need, please get our online timely service about alloy sputtering target. In addition to the product list below, you can also customize your own unique alloy sputtering target according to your specific needs.

Alloy sputtering target coating can be simply understood as using electrons or high-energy lasers to bombard the target, causing surface components to be sputtered out in the form of atomic clusters or ions, and ultimately deposited on the substrate surface, undergoing a film forming process, resulting in the formation of a thin film.

Sputtered coatings can be divided into many types. Overall, the difference from evaporation coatings is that the sputtering rate will become one of the main parameters. The laser sputtered coating PLD in sputtering coating can easily maintain component uniformity, while atomic scale thickness uniformity is relatively poor (due to pulse sputtering), and the control of crystal orientation (outer edge) growth is also relatively general.